Asempah, I.; Xu, J.; Yu, L.; Ju, H.; Wu, F.; Luo, H.
(Surface Engineering, 2019)
Titanium boron nitride (Ti-B-N) films with various boron contents were deposited using titanium and boron targets in a reactive magnetron sputtering system. The boron content in the film was varied from 0 at.-% to 8.7 at.-%, ...